Technical specification

1,3-Hexafluorobutadiene

CAS-NO: 685-63-2
UN No: 3160

Chemical Formula: C4F6

Appearance:

Colorless, liquefied gas, tasteless.

Type:

Electronic purity 4N

Purpose:
Electron gas
Applied to microelectronics manufacturing 45 ~ 25nm standard thin film plasma chemical etching process,
for slotting and opening.
It is possible to etch high aspect ratio, high anisotropy and smooth vertical wall structure.
Ozone safety (GWP 0.1).
Attributes:
Hexafluoro-1, 3-butadiene is a colorless, liquefied gas, tasteless, well soluble in organic
solvents and slightly soluble in water.
It is a stable gas under normal conditions and reacts with chlorine and bromine at higher
temperatures.
Under high pressure and temperature, hexafluorobutadiene dimer and trimer can be
polymerized.
Chemical composition of product:

Chemistry. Composition	Directory	Unit of measurement
Hexafluoro-1, 3-butadiene	99.995	%
Air, Max.	35	ppm
C-C4F6, max	50	ppm
Carbon dioxide, maximum	15	ppm
Water, Max.	2.2	ppm
Fluoride ion, maximum.	0.7	ppm

Attributes (reference data):

Molecular weight	162	Gram/mole
Density at 20 ℃ (liquid phase)	1434	Kg/m3
Melting point	-162	0C
Boiling point	6	0C
Saturated vapor pressure at 20 ℃	178.8	KPa
Relative density, gas (air = 1)	5.6
Relative density, liquid	1.4